Indium Tin Oxide Sputtering (ITO)Target
UMM specializes in producing high purity Indium Tin Oxide (ITO) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD...
Aluminium oxide target
UMM specializes in producing high purity Aluminum Oxide Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displa...
Gallium Oxide Sputtering Target
UMM specializes in producing high purity Gallium oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
Silicon Oxide Sputtering Target
UMM specializes in producing high purity Silicon oxide sputtering targets with the highest possible density High Purity (99.999%) Silicon Oxide Sputtering Targetand smallest possible average grain sizes for use in semiconductor, chemical vapor deposit...
  • Total 1 Page 4 Records