Rhodium Sputtering Target

Product ID:

Rhodium Sputtering Target


Rhodium Sputtering Target Related Applications, Forms & Industries

Electronics
High Purity Materials Metals
Pigments & Coatings
Research & Laboratory
Sputtering Targets
Thin Film Deposition

Rhodium Sputtering Target Specification

(2N) 99% Rhodium Sputtering Target
(3N) 99.9% Rhodium Sputtering Target

Rhodium Sputtering Target Properties
Molecular Weight 102.91
Appearance Gray
Melting Point 1966 °C
Boiling Point 3727 °C
Density 12.41 gm/cc
Thermal Expansion (25 °C) 8.2 µm·m-1·K-1
Tensile Strength N/A
Thermal Conductivity 1.50 W/cm/K @ 298.2 K
Young's Modulus 380 GPa
Vickers Hardness 1246 MPa
Poisson's Ratio 0.26
Electrical Resistivity 4.51 microhm-cm @ 20°C
Electronegativity 2.2 Paulings
Specific Heat 0.0583 Cal/g/K @ 25°C
Heat of Vaporization 127 K-Cal/gm atom at 3727°C

Packaging Specifications

Typical bulk packaging includes palletized plastic 5 gallon/25 kg,or according to clients' requirements

Other Sputtering Target Products
Product Name molecular formula Purity    Specification
Rhenium Target Re 4N-5N  
Vanadium target V 3N-4N Plate Shape
niobium target Nb 3N-4N Rotating Shape
Titanium target Ti 2N5-4N Can be customized per different request
Chromium target Cr 2N5-4N  
Copper target Cu 3N-5N  
Aluminum target Al 2N5-4N  
Ruthenium target Ru 3N-4N  
Iridium target Ir 3N-4N  
Rhodium target Rh 4N  

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